MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded This Test Method may be

This Test Method may be used to compare the oxygen reduction of two or more groups of silicon wafers

SEMI D20 — Terminology for FPD Mask Defect

It may be applied to subsystems of other multi-resource equipment

This Standard applies to mass flow controllers for gases used in semiconductor fabrication equipment

MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded This Test Method may beDimensional measurements made with an optical microscope are made on the optical image of the specimen and not directly on the specimen itself. The method of illuminating the specimen affects the image content, including the appearance of edges which are used in defining the size of the specimen. This Practice includes adjusting the microscope for Kohler illumination, which provides uniform illumination of the specimen, reduces stray light, and